Method for measuring elevation of independent structure

The invention discloses a method for measuring the elevation of an independent structure, which comprises the following steps: selecting two survey stations, which are in communication with a to-be-measured point and are positioned on the same vertical plane, on the ground far away from the structur...

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Bibliographische Detailangaben
Hauptverfasser: LIU SINONG, LIAO HONGYU, WANG JUN, HE HONGLING, LIU MINGZHOU, WEI MIN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a method for measuring the elevation of an independent structure, which comprises the following steps: selecting two survey stations, which are in communication with a to-be-measured point and are positioned on the same vertical plane, on the ground far away from the structure to be measured according to the angle measurement and distance measurement integrated function ofa total station and the advantages and characteristics of accurate data and convenience in operation of the total station and by combining a certain mathematical theory; erecting the total station atthe two survey stations respectively; observing two vertical angles and a section of horizontal distance; calculating the height difference between the top end of the structure to be measured and thesurvey stations through mathematical calculation; and obtaining the accurate elevation of the independent structure conveniently and quickly through the relationship between known points on the groundand the survey stations. Th