A vapor deposition apparatus

The invention provides a vapor deposition apparatus which can reduce the difference between the temperature of a substrate, a vapor deposition mask and the like to be adjusted and a target temperature. At least one of the substrate (W) and the vapor deposition mask (M) is an object to be adjusted in...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YANAGIHORI FUMITSUGU, YOSHIDA YUICHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
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