Apparatus and method for inspecting multi-layer structure method for fabricating semiconductor device comprising the method

Provided are a multilayer structure inspection apparatus and method of inspecting a multilayer structure in a sample without damaging the sample, the multilayer structure inspection apparatus being configured to measure both of reflectance and dispersion without damaging the sample, wherein the refl...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JUN CHUNG-SAM, KIM JUNG-WON, RYU SUNG-YOON, YANG YU-SIN, KWAK HYUN-SU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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