Geometries and patterns for surface texturing to increase deposition retention
A processing chamber component and a method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least amacro texture on a surface of the chamber component. The macro texture is defined by a plurality of...
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| creator | NISHIMURA YUKARI LU WILLIAM MING-YE SOMMERS JOSEPH F LUO SHAOAN BALESAN RAJAN WANG JIANQI |
| description | A processing chamber component and a method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least amacro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.
提供种处理腔室部件和用于制造所述处理腔室部件的方法。所述处理腔室部件以在此描述的方式制造，并包括在腔室部件的表面上至少宏观纹理的产生。所述宏观纹理由多个经设计的特征结构所限定，所述经设计的特征结构在腔室部件的表面上以预定方向布置。在某些实施方式中，这些经设计的特征结构避免在这些特征结构之间限定的视线表面的形成，以增强在腔室部件上沉积的膜留存。 |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN109599327A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN109599327A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN109599327A3</originalsourceid><addsrcrecordid>eNqNjDEKwkAQRbexEPUO4wECahDZUkLUKpV9WJK_sqCzy8wEPL4RPIDVe8XjLV13RX7BJEEp8EglmEFYKWYhnSSGAWR42ySJH2SZEg-CoKARJWuylJkEBv7a2i1ieCo2P67c9tLem1s1tz20zDeG9U233_mj9_XhdK7_aT5-ETeE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Geometries and patterns for surface texturing to increase deposition retention</title><source>esp@cenet</source><creator>NISHIMURA YUKARI ; LU WILLIAM MING-YE ; SOMMERS JOSEPH F ; LUO SHAOAN ; BALESAN RAJAN ; WANG JIANQI</creator><creatorcontrib>NISHIMURA YUKARI ; LU WILLIAM MING-YE ; SOMMERS JOSEPH F ; LUO SHAOAN ; BALESAN RAJAN ; WANG JIANQI</creatorcontrib><description>A processing chamber component and a method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least amacro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.
提供种处理腔室部件和用于制造所述处理腔室部件的方法。所述处理腔室部件以在此描述的方式制造，并包括在腔室部件的表面上至少宏观纹理的产生。所述宏观纹理由多个经设计的特征结构所限定，所述经设计的特征结构在腔室部件的表面上以预定方向布置。在某些实施方式中，这些经设计的特征结构避免在这些特征结构之间限定的视线表面的形成，以增强在腔室部件上沉积的膜留存。</description><language>chi ; eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SPRAYING OR ATOMISING IN GENERAL ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190409&DB=EPODOC&CC=CN&NR=109599327A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190409&DB=EPODOC&CC=CN&NR=109599327A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NISHIMURA YUKARI</creatorcontrib><creatorcontrib>LU WILLIAM MING-YE</creatorcontrib><creatorcontrib>SOMMERS JOSEPH F</creatorcontrib><creatorcontrib>LUO SHAOAN</creatorcontrib><creatorcontrib>BALESAN RAJAN</creatorcontrib><creatorcontrib>WANG JIANQI</creatorcontrib><title>Geometries and patterns for surface texturing to increase deposition retention</title><description>A processing chamber component and a method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least amacro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.
提供种处理腔室部件和用于制造所述处理腔室部件的方法。所述处理腔室部件以在此描述的方式制造，并包括在腔室部件的表面上至少宏观纹理的产生。所述宏观纹理由多个经设计的特征结构所限定，所述经设计的特征结构在腔室部件的表面上以预定方向布置。在某些实施方式中，这些经设计的特征结构避免在这些特征结构之间限定的视线表面的形成，以增强在腔室部件上沉积的膜留存。</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDEKwkAQRbexEPUO4wECahDZUkLUKpV9WJK_sqCzy8wEPL4RPIDVe8XjLV13RX7BJEEp8EglmEFYKWYhnSSGAWR42ySJH2SZEg-CoKARJWuylJkEBv7a2i1ieCo2P67c9tLem1s1tz20zDeG9U233_mj9_XhdK7_aT5-ETeE</recordid><startdate>20190409</startdate><enddate>20190409</enddate><creator>NISHIMURA YUKARI</creator><creator>LU WILLIAM MING-YE</creator><creator>SOMMERS JOSEPH F</creator><creator>LUO SHAOAN</creator><creator>BALESAN RAJAN</creator><creator>WANG JIANQI</creator><scope>EVB</scope></search><sort><creationdate>20190409</creationdate><title>Geometries and patterns for surface texturing to increase deposition retention</title><author>NISHIMURA YUKARI ; LU WILLIAM MING-YE ; SOMMERS JOSEPH F ; LUO SHAOAN ; BALESAN RAJAN ; WANG JIANQI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN109599327A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NISHIMURA YUKARI</creatorcontrib><creatorcontrib>LU WILLIAM MING-YE</creatorcontrib><creatorcontrib>SOMMERS JOSEPH F</creatorcontrib><creatorcontrib>LUO SHAOAN</creatorcontrib><creatorcontrib>BALESAN RAJAN</creatorcontrib><creatorcontrib>WANG JIANQI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NISHIMURA YUKARI</au><au>LU WILLIAM MING-YE</au><au>SOMMERS JOSEPH F</au><au>LUO SHAOAN</au><au>BALESAN RAJAN</au><au>WANG JIANQI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Geometries and patterns for surface texturing to increase deposition retention</title><date>2019-04-09</date><risdate>2019</risdate><abstract>A processing chamber component and a method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least amacro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.
提供种处理腔室部件和用于制造所述处理腔室部件的方法。所述处理腔室部件以在此描述的方式制造，并包括在腔室部件的表面上至少宏观纹理的产生。所述宏观纹理由多个经设计的特征结构所限定，所述经设计的特征结构在腔室部件的表面上以预定方向布置。在某些实施方式中，这些经设计的特征结构避免在这些特征结构之间限定的视线表面的形成，以增强在腔室部件上沉积的膜留存。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | Geometries and patterns for surface texturing to increase deposition retention |
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