Improved guidance of ions from a plasma to a substrate to be coated
The invention relates to a substrate holder (1) comprising a first contact (3) for the supply of a potential US to the substrate (2), a charging region (12) on the surface (11) of the substrate holder(1) being designed such that it can be charged (13) with ions (101, 102) from the ion source (104) o...
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| creator | DOBRYGIN WLADISLAW SCHMIDT OLIVER GUENTHER MARCUS |
| description | The invention relates to a substrate holder (1) comprising a first contact (3) for the supply of a potential US to the substrate (2), a charging region (12) on the surface (11) of the substrate holder(1) being designed such that it can be charged (13) with ions (101, 102) from the ion source (104) of a coating facility (100), and/or a second contact (4) is provided by means of which a freely selectable potential UH different from the potential US can be applied to an electrode region (14) on the surface (11) of the substrate holder (1). The invention also relates to a coating facility (100) comprising at least one ion source (104) and a first voltage source (106) that can be connected to the substrate to be coated (2) such that gas ions (101) and/or ions (102) of a coating material (103)can be accelerated in the direction of the substrate (2) from the ion source (104) by means of an electric potential US applied to the substrate (2) from the first voltage source (106), at least one secondary surface (11, 105) |
| format | Patent |
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The invention also relates to a coating facility (100) comprising at least one ion source (104) and a first voltage source (106) that can be connected to the substrate to be coated (2) such that gas ions (101) and/or ions (102) of a coating material (103)can be accelerated in the direction of the substrate (2) from the ion source (104) by means of an electric potential US applied to the substrate (2) from the first voltage source (106), at least one secondary surface (11, 105)</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190315&DB=EPODOC&CC=CN&NR=109477209A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190315&DB=EPODOC&CC=CN&NR=109477209A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DOBRYGIN WLADISLAW</creatorcontrib><creatorcontrib>SCHMIDT OLIVER</creatorcontrib><creatorcontrib>GUENTHER MARCUS</creatorcontrib><title>Improved guidance of ions from a plasma to a substrate to be coated</title><description>The invention relates to a substrate holder (1) comprising a first contact (3) for the supply of a potential US to the substrate (2), a charging region (12) on the surface (11) of the substrate holder(1) being designed such that it can be charged (13) with ions (101, 102) from the ion source (104) of a coating facility (100), and/or a second contact (4) is provided by means of which a freely selectable potential UH different from the potential US can be applied to an electrode region (14) on the surface (11) of the substrate holder (1). The invention also relates to a coating facility (100) comprising at least one ion source (104) and a first voltage source (106) that can be connected to the substrate to be coated (2) such that gas ions (101) and/or ions (102) of a coating material (103)can be accelerated in the direction of the substrate (2) from the ion source (104) by means of an electric potential US applied to the substrate (2) from the first voltage source (106), at least one secondary surface (11, 105)</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD2zC0oyi9LTVFIL81MScxLTlXIT1PIzM8rVkgrys9VSFQoyEkszk1UKMkHsotLk4pLihJLUkHcpFSF5HwgO4WHgTUtMac4lRdKczMourmGOHvophbkx6cWFyQmp-allsQ7-xkaWJqYmxsZWDoaE6MGABnVMZo</recordid><startdate>20190315</startdate><enddate>20190315</enddate><creator>DOBRYGIN WLADISLAW</creator><creator>SCHMIDT OLIVER</creator><creator>GUENTHER MARCUS</creator><scope>EVB</scope></search><sort><creationdate>20190315</creationdate><title>Improved guidance of ions from a plasma to a substrate to be coated</title><author>DOBRYGIN WLADISLAW ; SCHMIDT OLIVER ; GUENTHER MARCUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN109477209A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>DOBRYGIN WLADISLAW</creatorcontrib><creatorcontrib>SCHMIDT OLIVER</creatorcontrib><creatorcontrib>GUENTHER MARCUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DOBRYGIN WLADISLAW</au><au>SCHMIDT OLIVER</au><au>GUENTHER MARCUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Improved guidance of ions from a plasma to a substrate to be coated</title><date>2019-03-15</date><risdate>2019</risdate><abstract>The invention relates to a substrate holder (1) comprising a first contact (3) for the supply of a potential US to the substrate (2), a charging region (12) on the surface (11) of the substrate holder(1) being designed such that it can be charged (13) with ions (101, 102) from the ion source (104) of a coating facility (100), and/or a second contact (4) is provided by means of which a freely selectable potential UH different from the potential US can be applied to an electrode region (14) on the surface (11) of the substrate holder (1). The invention also relates to a coating facility (100) comprising at least one ion source (104) and a first voltage source (106) that can be connected to the substrate to be coated (2) such that gas ions (101) and/or ions (102) of a coating material (103)can be accelerated in the direction of the substrate (2) from the ion source (104) by means of an electric potential US applied to the substrate (2) from the first voltage source (106), at least one secondary surface (11, 105)</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Improved guidance of ions from a plasma to a substrate to be coated |
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