COATING PATTERN FORMATION METHOD, COATING PATTERN FORMATION DEVICE, AND SUBSTRATE WITH COATING PATTERN

Provided is a coating method that allows a coating pattern to be formed according to a previously set shape. Specifically, the present invention is a coating pattern formation method in which a coating solution is coated onto a pattern region provided on a substrate to form a coating pattern that ha...

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Bibliographische Detailangaben
Hauptverfasser: TOMOEDA SATOSHI, SHIMATANI KENICHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Provided is a coating method that allows a coating pattern to be formed according to a previously set shape. Specifically, the present invention is a coating pattern formation method in which a coating solution is coated onto a pattern region provided on a substrate to form a coating pattern that has the shape of the pattern region. The method has a lyophilicity adjustment step for adjusting the lyophilicity of the pattern region, and a coating pattern formation step for coating the pattern region, the lyophilicity of which has been adjusted, with the coating solution, and forming the coatingpattern. In the lyophilicity adjustment step, the pattern region is segmented into a plurality of small pattern regions with respect to at least one direction, the lyophilicity of the pattern region is adjusted so that adjacent small pattern regions each have different lyophilic characteristics, and in the segmenting direction, which is the direction in which the pattern region has been segmented,the small pattern regions