Inspection method, lithographic apparatus, mask and substrate

The embodiment of the invention relates to an inspection method, a lithographic apparatus, a mask and a substrate. The invention provides a method and an apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alterna...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, KESSELS LAMBERTUS GERARDUS MARIA, PIETERS MARCO JOHANNES ANNEMARIE, DEN BOEF ARIE JEFFREY, HINNEN PAUL CHRISTIAAN, ENGBLOM PETER DAVID, BHATTACHARYYA KAUSTUVE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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