Dry textured black silicon post-cleaning process

The invention discloses a dry textured black silicon post-cleaning process. The dry textured black silicon post-cleaning process includes: removing reaction by-products on a surface of a silicon waferby using HF; sequentially using deionized water, a KOH solution, deionized water, a HF/HCL mixed sol...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUANG LIJUN, YUAN NINGYI, WANG YAMIAN, LIU JINHAO, SHANGGUAN QUANYUAN, DING JIANNING, HAN PEIYONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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