Embedded capacity substrate and processing method

The invention relates to an embedded capacity substrate and a processing method. The embedded capacity substrate comprises a first electrode layer, a second electrode layer and soft materials, whereinthe soft materials are positioned between the first electrode layer and the second electrode layer,...

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Bibliographische Detailangaben
Hauptverfasser: JASON HAN, LINDA CHENG, AILEEN LIN, KENNY LO, JUNPEN WANG, LANSERO OU
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to an embedded capacity substrate and a processing method. The embedded capacity substrate comprises a first electrode layer, a second electrode layer and soft materials, whereinthe soft materials are positioned between the first electrode layer and the second electrode layer, the second electrode layer comprises a first inner metal layer and a first outer metal layer, the first inner metal layer is adhered with a first soft material, and the first outer metal layer is combined with the first inner metal layer. 本发明涉及种埋容基板及加工方法。本发明所揭示的埋层基板包含第电极层和第二电极层;以及位于所述第电极层和所述第二电极层之间的软性材料;其中所述第二电极层包含第内侧金属层和第外侧金属层,所述第内侧金属层与所述第软性材料粘结,所述第外侧金属层与所述第内侧金属层结合。