Ion implanter and method implanting ion into semiconductor substrate

An ion implanter comprises a dissociation chamber in the ion implanter. The dissociation chamber has an input port for receiving a gas and an output port for outputting ions. A vacuum chamber surrounds the dissociation chamber. A plurality of rods or plates of magnetic material are located adjacent to the dissociation chamber on at least two sides of the dissociation chamber. A magnet is magnetically coupled to the plurality of rods or plates of magnetic material. A microwave source is provided for supplying microwaves to the dissociation chamber, so as to cause electron cyclotron resonance inthe dissociation chamber to ionize the gas. The ion implanter can improve the service life and reduce the maintenance cost of the ion implanter. 种离子植入机包括离解腔室，所述离解腔室位于所述离子植入机中。所述离解腔室具有用于接收气体的输入口及用于输出离子的输出口。真空腔室环绕所述离解腔室。多个磁性材料棒或板在所述离解腔室的至少两个侧上与所述离解腔室相邻。磁体磁性耦合至所述多个磁性材料棒或板。微波源被提供用于向所述离解腔室供应微波，以在所述离解腔室中引起电子回旋共振来将所述气体电离。本发明实施例的离子植入机可提高离子植入机的寿命及降低离子植入机的维护成本。