Corrosion device and corrosion method for realizing relative rotation of adjacent wafers

The invention discloses a corrosion device and corrosion method for realizing relative rotation of adjacent wafers. The corrosion device is composed of a carrier, a mechanical arm, a corrosion processtank and a mixed acid tank. The carrier includes two groups of side plates and fixed rods fixed and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BIAN YONGZHI, ZHANG LIANG, DU JUAN, CHENG FENGLING, NING YONGDUO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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