InP-based nano grating and manufacturing method thereof

The invention provides an InP-based nano grating and a manufacturing method thereof. The manufacturing method comprises the steps of growing SiNx film on an InP-based wafer; sequentially spin coatingan anti-reflective coating and a photoresist layer, and forming a grating pattern on the photoresist...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIU KUN, TIAN KUN, MO CAIPING, DUAN LIHUA, YE SIRONG, HUANG JUNLONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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