PLASMA IMPEDANCE MATCHING UNIT, SYSTEM FOR SUPPLYING RF POWER TO A PLASMA LOAD, AND METHOD OF SUPPLYING RF POWER TO A PLASMA LOAD

A plasma impedance matching unit (13) for a plasma power supply system (10, 100) comprises a. a first power connector (40) for coupling the matching unit (13) to a power source (11), b. a second powerconnector (41) for coupling the matching unit (13) to a plasma load (20), c. a data link interface (...

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Hauptverfasser: BUGYI RAFAL, GLAZEK WOJCIECH
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creator BUGYI RAFAL
GLAZEK WOJCIECH
description A plasma impedance matching unit (13) for a plasma power supply system (10, 100) comprises a. a first power connector (40) for coupling the matching unit (13) to a power source (11), b. a second powerconnector (41) for coupling the matching unit (13) to a plasma load (20), c. a data link interface (45) for directly coupling the impedance matching unit (13) to another plasma impedance matching unit (14) of the plasma power supply system (10, 100) via a data link (48), d. a controller (42) configured to control the matching unit (13) in order to match the impedance from the first power connector (40) to the impedance at the second power connector (41), wherein e. the controller (42) is configured to operate as a master for at least one other impedance matching unit (14) and/or at least oneRF power source (11, 12) of the plasma power supply system (10, 100), wherein the controller (42) communicates via the data link interface (45) with the other impedance matching unit(s) (14) and/or RFpower source(s) (11, 12) o
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subjects BASIC ELECTRIC ELEMENTS
BASIC ELECTRONIC CIRCUITRY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
RESONATORS
title PLASMA IMPEDANCE MATCHING UNIT, SYSTEM FOR SUPPLYING RF POWER TO A PLASMA LOAD, AND METHOD OF SUPPLYING RF POWER TO A PLASMA LOAD
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