Plasma denitration device
The invention discloses a plasma denitration device which comprises a plasma generator and a denitration reaction container, wherein a urea solution is stored in the denitration reaction container; filler is arranged in the denitration reaction container; the device also comprises a spraying device...
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| Hauptverfasser: | , |
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The invention discloses a plasma denitration device which comprises a plasma generator and a denitration reaction container, wherein a urea solution is stored in the denitration reaction container; filler is arranged in the denitration reaction container; the device also comprises a spraying device which sprays the urea solution to the filler and forms an urea liquid membrane in the filler; part of flue gas containing NO enters the plasma generator while the other part enters the denitration reaction container to break through the urea liquid membrane from the direction below the urea liquid membrane; oxygen is introduced into the plasma generator to be reacted with NO in the plasma generator, flue gas discharged from the plasma generator after reaction enters the denitration reaction container to enter the filler and breaks through the urea liquid membrane with the other part of the flue gas, and the flue gas in the denitration reaction container after reaction is discharged from theflue gas discharge pipe. |
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