Variable radius mirror dichroic beam splitter module for extreme ultraviolet source
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.
种激光产生等离子体极紫外激光源,包括至少个可变半径反射镜。至少个可变半径反射镜用于调整主脉冲的在与预脉冲焦面相距指定距离处的光束直径,其中预脉冲将微滴辐射成靶微滴并且主脉冲将靶微滴辐射成等离子体状态以生成极紫外辐射。 |
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