CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR FORMING PATTERN, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK
The present invention provides: a curable composition for imprinting, which can both improve mold release properties and suppress the occurrence of waviness during etching; a cured product obtained using this curable composition for imprinting; a method for forming a pattern; a lithography method; a...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KITAGAWA HIROTAKA MARUMO KAZUHIRO GOTO YUICHIRO OOMATSU TADASHI |
| description | The present invention provides: a curable composition for imprinting, which can both improve mold release properties and suppress the occurrence of waviness during etching; a cured product obtained using this curable composition for imprinting; a method for forming a pattern; a lithography method; a pattern; and a lithography mask. The curable composition for imprinting contains a monofunctional polymerizable compound, a polyfunctional polymerizable compound which includes at least one of an alicyclic structure and an aromatic structure and which has a viscosity at 25 DEG C of 150 mPa.s or less, and a photopolymerization initiator, wherein the monofunctional polymerizable compound is contained at a quantity of 5-30 mass % relative to the total quantity of polymerizable compounds in the curable composition for imprinting, and a cured film of the curable composition for imprinting has an elastic modulus of 3.5 GPa or less and a glass transition temperature of 90 DEG C or higher.
本发明提供种能够兼顾提高脱模性和抑制蚀刻时产生起伏的压印用固化性 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN107408495A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN107408495A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN107408495A3</originalsourceid><addsrcrecordid>eNqNyr0KwjAYheEsDqLew-ceoWJFHWOSNsHmh_Tr4FSKxEm0UHdv3SB1cHM4nOF9puTFm8COlQTujHe1Ru0sFC6ANj5oi9qWFJKRAnxwouFIwUhUTnxUmkkEPEOUwVKodGplYF6dR0e_EZgVv53VpzmZXLvbEBfjz8iykMjVKvaPNg59d4n3-Gy5XWe7PNvnhy3b_GPeUjE8HA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR FORMING PATTERN, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK</title><source>esp@cenet</source><creator>KITAGAWA HIROTAKA ; MARUMO KAZUHIRO ; GOTO YUICHIRO ; OOMATSU TADASHI</creator><creatorcontrib>KITAGAWA HIROTAKA ; MARUMO KAZUHIRO ; GOTO YUICHIRO ; OOMATSU TADASHI</creatorcontrib><description>The present invention provides: a curable composition for imprinting, which can both improve mold release properties and suppress the occurrence of waviness during etching; a cured product obtained using this curable composition for imprinting; a method for forming a pattern; a lithography method; a pattern; and a lithography mask. The curable composition for imprinting contains a monofunctional polymerizable compound, a polyfunctional polymerizable compound which includes at least one of an alicyclic structure and an aromatic structure and which has a viscosity at 25 DEG C of 150 mPa.s or less, and a photopolymerization initiator, wherein the monofunctional polymerizable compound is contained at a quantity of 5-30 mass % relative to the total quantity of polymerizable compounds in the curable composition for imprinting, and a cured film of the curable composition for imprinting has an elastic modulus of 3.5 GPa or less and a glass transition temperature of 90 DEG C or higher.
本发明提供种能够兼顾提高脱模性和抑制蚀刻时产生起伏的压印用固化性</description><language>chi ; eng</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PERFORMING OPERATIONS ; SEMICONDUCTOR DEVICES ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171128&DB=EPODOC&CC=CN&NR=107408495A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171128&DB=EPODOC&CC=CN&NR=107408495A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KITAGAWA HIROTAKA</creatorcontrib><creatorcontrib>MARUMO KAZUHIRO</creatorcontrib><creatorcontrib>GOTO YUICHIRO</creatorcontrib><creatorcontrib>OOMATSU TADASHI</creatorcontrib><title>CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR FORMING PATTERN, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK</title><description>The present invention provides: a curable composition for imprinting, which can both improve mold release properties and suppress the occurrence of waviness during etching; a cured product obtained using this curable composition for imprinting; a method for forming a pattern; a lithography method; a pattern; and a lithography mask. The curable composition for imprinting contains a monofunctional polymerizable compound, a polyfunctional polymerizable compound which includes at least one of an alicyclic structure and an aromatic structure and which has a viscosity at 25 DEG C of 150 mPa.s or less, and a photopolymerization initiator, wherein the monofunctional polymerizable compound is contained at a quantity of 5-30 mass % relative to the total quantity of polymerizable compounds in the curable composition for imprinting, and a cured film of the curable composition for imprinting has an elastic modulus of 3.5 GPa or less and a glass transition temperature of 90 DEG C or higher.
本发明提供种能够兼顾提高脱模性和抑制蚀刻时产生起伏的压印用固化性</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PERFORMING OPERATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyr0KwjAYheEsDqLew-ceoWJFHWOSNsHmh_Tr4FSKxEm0UHdv3SB1cHM4nOF9puTFm8COlQTujHe1Ru0sFC6ANj5oi9qWFJKRAnxwouFIwUhUTnxUmkkEPEOUwVKodGplYF6dR0e_EZgVv53VpzmZXLvbEBfjz8iykMjVKvaPNg59d4n3-Gy5XWe7PNvnhy3b_GPeUjE8HA</recordid><startdate>20171128</startdate><enddate>20171128</enddate><creator>KITAGAWA HIROTAKA</creator><creator>MARUMO KAZUHIRO</creator><creator>GOTO YUICHIRO</creator><creator>OOMATSU TADASHI</creator><scope>EVB</scope></search><sort><creationdate>20171128</creationdate><title>CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR FORMING PATTERN, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK</title><author>KITAGAWA HIROTAKA ; MARUMO KAZUHIRO ; GOTO YUICHIRO ; OOMATSU TADASHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107408495A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PERFORMING OPERATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>KITAGAWA HIROTAKA</creatorcontrib><creatorcontrib>MARUMO KAZUHIRO</creatorcontrib><creatorcontrib>GOTO YUICHIRO</creatorcontrib><creatorcontrib>OOMATSU TADASHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KITAGAWA HIROTAKA</au><au>MARUMO KAZUHIRO</au><au>GOTO YUICHIRO</au><au>OOMATSU TADASHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR FORMING PATTERN, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK</title><date>2017-11-28</date><risdate>2017</risdate><abstract>The present invention provides: a curable composition for imprinting, which can both improve mold release properties and suppress the occurrence of waviness during etching; a cured product obtained using this curable composition for imprinting; a method for forming a pattern; a lithography method; a pattern; and a lithography mask. The curable composition for imprinting contains a monofunctional polymerizable compound, a polyfunctional polymerizable compound which includes at least one of an alicyclic structure and an aromatic structure and which has a viscosity at 25 DEG C of 150 mPa.s or less, and a photopolymerization initiator, wherein the monofunctional polymerizable compound is contained at a quantity of 5-30 mass % relative to the total quantity of polymerizable compounds in the curable composition for imprinting, and a cured film of the curable composition for imprinting has an elastic modulus of 3.5 GPa or less and a glass transition temperature of 90 DEG C or higher.
本发明提供种能够兼顾提高脱模性和抑制蚀刻时产生起伏的压印用固化性</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN107408495A |
| source | esp@cenet |
| subjects | AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
| title | CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR FORMING PATTERN, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T08%3A20%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KITAGAWA%20HIROTAKA&rft.date=2017-11-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN107408495A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |