Exposure machine
The invention provides an exposure machine. A transparent protection cover encircling a light source lamp room and an illuminating lens group is arranged outside an exposure chamber, a space with clean indoor air for isolating external environment is provided for the light source lamp room and the i...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | WANG WEI XU JUN'AN JIANG MINCHENG XIONG DING LIN MINGWEN YANG JINSEN |
| description | The invention provides an exposure machine. A transparent protection cover encircling a light source lamp room and an illuminating lens group is arranged outside an exposure chamber, a space with clean indoor air for isolating external environment is provided for the light source lamp room and the illuminating lens group, and the transparent protection cover is connected and communicated with a first gas delivery pipeline. Gas is delivered into the transparent protection cover by the first gas delivery pipeline, so that the light source lamp room and the illuminating lens group are cooled, and the problem of atomization of an external lens of the exposure chamber as the light source lamp room and the illuminating lens group are cooled by directly extracting the clean indoor air in the prior art can be avoided, so that the light source lamp room and lenses of the illuminating lens group can be protected, an expensive high-pressure mercury lamp or lens can be saved, and the production cost is effectively lowere |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN107367909A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN107367909A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN107367909A3</originalsourceid><addsrcrecordid>eNrjZBBwrSjILy4tSlXITUzOyMxL5WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgbmxmbmlgaWjsbEqAEAsQUfWw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Exposure machine</title><source>esp@cenet</source><creator>WANG WEI ; XU JUN'AN ; JIANG MINCHENG ; XIONG DING ; LIN MINGWEN ; YANG JINSEN</creator><creatorcontrib>WANG WEI ; XU JUN'AN ; JIANG MINCHENG ; XIONG DING ; LIN MINGWEN ; YANG JINSEN</creatorcontrib><description>The invention provides an exposure machine. A transparent protection cover encircling a light source lamp room and an illuminating lens group is arranged outside an exposure chamber, a space with clean indoor air for isolating external environment is provided for the light source lamp room and the illuminating lens group, and the transparent protection cover is connected and communicated with a first gas delivery pipeline. Gas is delivered into the transparent protection cover by the first gas delivery pipeline, so that the light source lamp room and the illuminating lens group are cooled, and the problem of atomization of an external lens of the exposure chamber as the light source lamp room and the illuminating lens group are cooled by directly extracting the clean indoor air in the prior art can be avoided, so that the light source lamp room and lenses of the illuminating lens group can be protected, an expensive high-pressure mercury lamp or lens can be saved, and the production cost is effectively lowere</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171121&DB=EPODOC&CC=CN&NR=107367909A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171121&DB=EPODOC&CC=CN&NR=107367909A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WANG WEI</creatorcontrib><creatorcontrib>XU JUN'AN</creatorcontrib><creatorcontrib>JIANG MINCHENG</creatorcontrib><creatorcontrib>XIONG DING</creatorcontrib><creatorcontrib>LIN MINGWEN</creatorcontrib><creatorcontrib>YANG JINSEN</creatorcontrib><title>Exposure machine</title><description>The invention provides an exposure machine. A transparent protection cover encircling a light source lamp room and an illuminating lens group is arranged outside an exposure chamber, a space with clean indoor air for isolating external environment is provided for the light source lamp room and the illuminating lens group, and the transparent protection cover is connected and communicated with a first gas delivery pipeline. Gas is delivered into the transparent protection cover by the first gas delivery pipeline, so that the light source lamp room and the illuminating lens group are cooled, and the problem of atomization of an external lens of the exposure chamber as the light source lamp room and the illuminating lens group are cooled by directly extracting the clean indoor air in the prior art can be avoided, so that the light source lamp room and lenses of the illuminating lens group can be protected, an expensive high-pressure mercury lamp or lens can be saved, and the production cost is effectively lowere</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBBwrSjILy4tSlXITUzOyMxL5WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgbmxmbmlgaWjsbEqAEAsQUfWw</recordid><startdate>20171121</startdate><enddate>20171121</enddate><creator>WANG WEI</creator><creator>XU JUN'AN</creator><creator>JIANG MINCHENG</creator><creator>XIONG DING</creator><creator>LIN MINGWEN</creator><creator>YANG JINSEN</creator><scope>EVB</scope></search><sort><creationdate>20171121</creationdate><title>Exposure machine</title><author>WANG WEI ; XU JUN'AN ; JIANG MINCHENG ; XIONG DING ; LIN MINGWEN ; YANG JINSEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107367909A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WANG WEI</creatorcontrib><creatorcontrib>XU JUN'AN</creatorcontrib><creatorcontrib>JIANG MINCHENG</creatorcontrib><creatorcontrib>XIONG DING</creatorcontrib><creatorcontrib>LIN MINGWEN</creatorcontrib><creatorcontrib>YANG JINSEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WANG WEI</au><au>XU JUN'AN</au><au>JIANG MINCHENG</au><au>XIONG DING</au><au>LIN MINGWEN</au><au>YANG JINSEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Exposure machine</title><date>2017-11-21</date><risdate>2017</risdate><abstract>The invention provides an exposure machine. A transparent protection cover encircling a light source lamp room and an illuminating lens group is arranged outside an exposure chamber, a space with clean indoor air for isolating external environment is provided for the light source lamp room and the illuminating lens group, and the transparent protection cover is connected and communicated with a first gas delivery pipeline. Gas is delivered into the transparent protection cover by the first gas delivery pipeline, so that the light source lamp room and the illuminating lens group are cooled, and the problem of atomization of an external lens of the exposure chamber as the light source lamp room and the illuminating lens group are cooled by directly extracting the clean indoor air in the prior art can be avoided, so that the light source lamp room and lenses of the illuminating lens group can be protected, an expensive high-pressure mercury lamp or lens can be saved, and the production cost is effectively lowere</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN107367909A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Exposure machine |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T21%3A56%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WANG%20WEI&rft.date=2017-11-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN107367909A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |