Methods And Apparatus For Controlling Temperature Of A Multi-Zone Heater In A Process Chamber
Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some emb...
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| creator | AMBAL HARI KISHORE HALLER UWE PAUL ZHOU JIANHUA |
| description | Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
本发明提供用于控制在处理腔室内的多区域加热器的温度的方法与装置。在些实施方式中，提供控制多区域加热器的方法，所述多区域加热器被配置在基板支撑件上，其中所述多区域加热器具有第区域与第二区域。在些实施方式中，所述方法可包括以下步骤：测量在第时间内被第区域获取的电流；测量在第时间内被第区域获取的电压；根据在第时间内测量到的被第区域获取的电流与电压计算出第区域的电阻；根据在第区域的电阻与温度之间 |
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本发明提供用于控制在处理腔室内的多区域加热器的温度的方法与装置。在些实施方式中，提供控制多区域加热器的方法，所述多区域加热器被配置在基板支撑件上，其中所述多区域加热器具有第区域与第二区域。在些实施方式中，所述方法可包括以下步骤：测量在第时间内被第区域获取的电流；测量在第时间内被第区域获取的电压；根据在第时间内测量到的被第区域获取的电流与电压计算出第区域的电阻；根据在第区域的电阻与温度之间</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CONTROLLING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PHYSICS ; REGULATING ; SEMICONDUCTOR DEVICES ; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170926&DB=EPODOC&CC=CN&NR=107204306A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170926&DB=EPODOC&CC=CN&NR=107204306A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AMBAL HARI KISHORE</creatorcontrib><creatorcontrib>HALLER UWE PAUL</creatorcontrib><creatorcontrib>ZHOU JIANHUA</creatorcontrib><title>Methods And Apparatus For Controlling Temperature Of A Multi-Zone Heater In A Process Chamber</title><description>Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
本发明提供用于控制在处理腔室内的多区域加热器的温度的方法与装置。在些实施方式中，提供控制多区域加热器的方法，所述多区域加热器被配置在基板支撑件上，其中所述多区域加热器具有第区域与第二区域。在些实施方式中，所述方法可包括以下步骤：测量在第时间内被第区域获取的电流；测量在第时间内被第区域获取的电压；根据在第时间内测量到的被第区域获取的电流与电压计算出第区域的电阻；根据在第区域的电阻与温度之间</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CONTROLLING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PHYSICS</subject><subject>REGULATING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNikEKwjAUBbtxIeodvgcoVCu6DsFSF1UXXQkisX21hTQ__KT3V8EDuBqYmXlyrxB7bgMp15Ly3oiJU6CChTS7KGzt4F5UY_T4JgFdOlJUTTYO6Y0dqISJEDq5j74KNwiBdG_GJ2SZzDpjA1Y_LpJ1cax1mcLzA8GbBg7xoc-b7LDNdnm2V_k_zxsYnTpW</recordid><startdate>20170926</startdate><enddate>20170926</enddate><creator>AMBAL HARI KISHORE</creator><creator>HALLER UWE PAUL</creator><creator>ZHOU JIANHUA</creator><scope>EVB</scope></search><sort><creationdate>20170926</creationdate><title>Methods And Apparatus For Controlling Temperature Of A Multi-Zone Heater In A Process Chamber</title><author>AMBAL HARI KISHORE ; HALLER UWE PAUL ; ZHOU JIANHUA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107204306A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CONTROLLING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PHYSICS</topic><topic>REGULATING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</topic><toplevel>online_resources</toplevel><creatorcontrib>AMBAL HARI KISHORE</creatorcontrib><creatorcontrib>HALLER UWE PAUL</creatorcontrib><creatorcontrib>ZHOU JIANHUA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>AMBAL HARI KISHORE</au><au>HALLER UWE PAUL</au><au>ZHOU JIANHUA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods And Apparatus For Controlling Temperature Of A Multi-Zone Heater In A Process Chamber</title><date>2017-09-26</date><risdate>2017</risdate><abstract>Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
本发明提供用于控制在处理腔室内的多区域加热器的温度的方法与装置。在些实施方式中，提供控制多区域加热器的方法，所述多区域加热器被配置在基板支撑件上，其中所述多区域加热器具有第区域与第二区域。在些实施方式中，所述方法可包括以下步骤：测量在第时间内被第区域获取的电流；测量在第时间内被第区域获取的电压；根据在第时间内测量到的被第区域获取的电流与电压计算出第区域的电阻；根据在第区域的电阻与温度之间</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES |
| title | Methods And Apparatus For Controlling Temperature Of A Multi-Zone Heater In A Process Chamber |
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