Auxiliary exposure device
The present invention provides an auxiliary exposure device capable of improving exposure resolution. The auxiliary exposure device according to the present embodiment is disposed on the front stage or the rear stage of the exposure device for subjecting the substrate to be subjected to the exposure...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | YOSHIHARU OTA JUN SATAKE |
| description | The present invention provides an auxiliary exposure device capable of improving exposure resolution. The auxiliary exposure device according to the present embodiment is disposed on the front stage or the rear stage of the exposure device for subjecting the substrate to be subjected to the exposure treatment, and the substrate to be processed is subjected to a local exposure process including a transport unit and a light source unit. The transport unit transfers the processed substrate in the scanning direction. The light source unit irradiates a substrate to be processed that is conveyed in the scanning direction and irradiates a linear light having a long side direction in a direction intersecting with the scanning direction. In addition, the light source unit is configured to include a digital micromirror device in which a plurality of movable micromirrors are arranged.
本发明提供种能够提高曝光解像度的辅助曝光装置。本实施方式的辅助曝光装置配置在对被处理基板进行曝光处理的曝光装置的前级侧或者后级侧，对被处理基板进行局部曝光处理，包括搬送部和光源单元。搬送部将被处理基板在扫描方向上搬送。光源单元对在扫描方向上被搬送的被处理基板，照射以与扫描方 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN107193185A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN107193185A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN107193185A3</originalsourceid><addsrcrecordid>eNrjZJB0LK3IzMlMLKpUSK0oyC8uLUpVSEkty0xO5WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgbmhpbGhhamjsbEqAEAOmQi6Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Auxiliary exposure device</title><source>esp@cenet</source><creator>YOSHIHARU OTA ; JUN SATAKE</creator><creatorcontrib>YOSHIHARU OTA ; JUN SATAKE</creatorcontrib><description>The present invention provides an auxiliary exposure device capable of improving exposure resolution. The auxiliary exposure device according to the present embodiment is disposed on the front stage or the rear stage of the exposure device for subjecting the substrate to be subjected to the exposure treatment, and the substrate to be processed is subjected to a local exposure process including a transport unit and a light source unit. The transport unit transfers the processed substrate in the scanning direction. The light source unit irradiates a substrate to be processed that is conveyed in the scanning direction and irradiates a linear light having a long side direction in a direction intersecting with the scanning direction. In addition, the light source unit is configured to include a digital micromirror device in which a plurality of movable micromirrors are arranged.
本发明提供种能够提高曝光解像度的辅助曝光装置。本实施方式的辅助曝光装置配置在对被处理基板进行曝光处理的曝光装置的前级侧或者后级侧，对被处理基板进行局部曝光处理，包括搬送部和光源单元。搬送部将被处理基板在扫描方向上搬送。光源单元对在扫描方向上被搬送的被处理基板，照射以与扫描方</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170922&DB=EPODOC&CC=CN&NR=107193185A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170922&DB=EPODOC&CC=CN&NR=107193185A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YOSHIHARU OTA</creatorcontrib><creatorcontrib>JUN SATAKE</creatorcontrib><title>Auxiliary exposure device</title><description>The present invention provides an auxiliary exposure device capable of improving exposure resolution. The auxiliary exposure device according to the present embodiment is disposed on the front stage or the rear stage of the exposure device for subjecting the substrate to be subjected to the exposure treatment, and the substrate to be processed is subjected to a local exposure process including a transport unit and a light source unit. The transport unit transfers the processed substrate in the scanning direction. The light source unit irradiates a substrate to be processed that is conveyed in the scanning direction and irradiates a linear light having a long side direction in a direction intersecting with the scanning direction. In addition, the light source unit is configured to include a digital micromirror device in which a plurality of movable micromirrors are arranged.
本发明提供种能够提高曝光解像度的辅助曝光装置。本实施方式的辅助曝光装置配置在对被处理基板进行曝光处理的曝光装置的前级侧或者后级侧，对被处理基板进行局部曝光处理，包括搬送部和光源单元。搬送部将被处理基板在扫描方向上搬送。光源单元对在扫描方向上被搬送的被处理基板，照射以与扫描方</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJB0LK3IzMlMLKpUSK0oyC8uLUpVSEkty0xO5WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hgbmhpbGhhamjsbEqAEAOmQi6Q</recordid><startdate>20170922</startdate><enddate>20170922</enddate><creator>YOSHIHARU OTA</creator><creator>JUN SATAKE</creator><scope>EVB</scope></search><sort><creationdate>20170922</creationdate><title>Auxiliary exposure device</title><author>YOSHIHARU OTA ; JUN SATAKE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107193185A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>YOSHIHARU OTA</creatorcontrib><creatorcontrib>JUN SATAKE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YOSHIHARU OTA</au><au>JUN SATAKE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Auxiliary exposure device</title><date>2017-09-22</date><risdate>2017</risdate><abstract>The present invention provides an auxiliary exposure device capable of improving exposure resolution. The auxiliary exposure device according to the present embodiment is disposed on the front stage or the rear stage of the exposure device for subjecting the substrate to be subjected to the exposure treatment, and the substrate to be processed is subjected to a local exposure process including a transport unit and a light source unit. The transport unit transfers the processed substrate in the scanning direction. The light source unit irradiates a substrate to be processed that is conveyed in the scanning direction and irradiates a linear light having a long side direction in a direction intersecting with the scanning direction. In addition, the light source unit is configured to include a digital micromirror device in which a plurality of movable micromirrors are arranged.
本发明提供种能够提高曝光解像度的辅助曝光装置。本实施方式的辅助曝光装置配置在对被处理基板进行曝光处理的曝光装置的前级侧或者后级侧，对被处理基板进行局部曝光处理，包括搬送部和光源单元。搬送部将被处理基板在扫描方向上搬送。光源单元对在扫描方向上被搬送的被处理基板，照射以与扫描方</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN107193185A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Auxiliary exposure device |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T15%3A37%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YOSHIHARU%20OTA&rft.date=2017-09-22&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN107193185A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |