APR plate and application thereof
The invention discloses an APR plate and application thereof. The APR plate comprises an APR plate bottom layer and a photosensitive resin layer arranged on the upper surface of the APR plate bottom layer, wherein a first microgroove region and a second microgroove region are arranged on the photose...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | LIU FALIN LIAO CONGXIONG LI LIN YU CHUNQI KANG MINYANG |
description | The invention discloses an APR plate and application thereof. The APR plate comprises an APR plate bottom layer and a photosensitive resin layer arranged on the upper surface of the APR plate bottom layer, wherein a first microgroove region and a second microgroove region are arranged on the photosensitive resin layer, and microgroove depths of the first microgroove region and the second microgroove region are different; the first microgroove region corresponds to a first region of the flexible substrate; the second microgroove region corresponds to a second region of the flexible substrate; and a first cutting line is arranged in the first region. The APR plate disclosed by the invention is utilized for making a cutting compensation layer on the surface of the flexible substrate, height of a projection after cutting can be effectively reduced, and the defect that product display is uneven due to GAP enlargement at the projection caused by the projection height is eliminated; meanwhile, the problem that frame |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN107015438A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN107015438A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN107015438A3</originalsourceid><addsrcrecordid>eNrjZFB0DAhSKMhJLElVSMxLUUgsKMjJTE4syczPUyjJSC1KzU_jYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GBuYGhqYmxhaOxsSoAQBLryUv</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APR plate and application thereof</title><source>esp@cenet</source><creator>LIU FALIN ; LIAO CONGXIONG ; LI LIN ; YU CHUNQI ; KANG MINYANG</creator><creatorcontrib>LIU FALIN ; LIAO CONGXIONG ; LI LIN ; YU CHUNQI ; KANG MINYANG</creatorcontrib><description>The invention discloses an APR plate and application thereof. The APR plate comprises an APR plate bottom layer and a photosensitive resin layer arranged on the upper surface of the APR plate bottom layer, wherein a first microgroove region and a second microgroove region are arranged on the photosensitive resin layer, and microgroove depths of the first microgroove region and the second microgroove region are different; the first microgroove region corresponds to a first region of the flexible substrate; the second microgroove region corresponds to a second region of the flexible substrate; and a first cutting line is arranged in the first region. The APR plate disclosed by the invention is utilized for making a cutting compensation layer on the surface of the flexible substrate, height of a projection after cutting can be effectively reduced, and the defect that product display is uneven due to GAP enlargement at the projection caused by the projection height is eliminated; meanwhile, the problem that frame</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170804&DB=EPODOC&CC=CN&NR=107015438A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170804&DB=EPODOC&CC=CN&NR=107015438A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIU FALIN</creatorcontrib><creatorcontrib>LIAO CONGXIONG</creatorcontrib><creatorcontrib>LI LIN</creatorcontrib><creatorcontrib>YU CHUNQI</creatorcontrib><creatorcontrib>KANG MINYANG</creatorcontrib><title>APR plate and application thereof</title><description>The invention discloses an APR plate and application thereof. The APR plate comprises an APR plate bottom layer and a photosensitive resin layer arranged on the upper surface of the APR plate bottom layer, wherein a first microgroove region and a second microgroove region are arranged on the photosensitive resin layer, and microgroove depths of the first microgroove region and the second microgroove region are different; the first microgroove region corresponds to a first region of the flexible substrate; the second microgroove region corresponds to a second region of the flexible substrate; and a first cutting line is arranged in the first region. The APR plate disclosed by the invention is utilized for making a cutting compensation layer on the surface of the flexible substrate, height of a projection after cutting can be effectively reduced, and the defect that product display is uneven due to GAP enlargement at the projection caused by the projection height is eliminated; meanwhile, the problem that frame</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB0DAhSKMhJLElVSMxLUUgsKMjJTE4syczPUyjJSC1KzU_jYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GBuYGhqYmxhaOxsSoAQBLryUv</recordid><startdate>20170804</startdate><enddate>20170804</enddate><creator>LIU FALIN</creator><creator>LIAO CONGXIONG</creator><creator>LI LIN</creator><creator>YU CHUNQI</creator><creator>KANG MINYANG</creator><scope>EVB</scope></search><sort><creationdate>20170804</creationdate><title>APR plate and application thereof</title><author>LIU FALIN ; LIAO CONGXIONG ; LI LIN ; YU CHUNQI ; KANG MINYANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107015438A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>LIU FALIN</creatorcontrib><creatorcontrib>LIAO CONGXIONG</creatorcontrib><creatorcontrib>LI LIN</creatorcontrib><creatorcontrib>YU CHUNQI</creatorcontrib><creatorcontrib>KANG MINYANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIU FALIN</au><au>LIAO CONGXIONG</au><au>LI LIN</au><au>YU CHUNQI</au><au>KANG MINYANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APR plate and application thereof</title><date>2017-08-04</date><risdate>2017</risdate><abstract>The invention discloses an APR plate and application thereof. The APR plate comprises an APR plate bottom layer and a photosensitive resin layer arranged on the upper surface of the APR plate bottom layer, wherein a first microgroove region and a second microgroove region are arranged on the photosensitive resin layer, and microgroove depths of the first microgroove region and the second microgroove region are different; the first microgroove region corresponds to a first region of the flexible substrate; the second microgroove region corresponds to a second region of the flexible substrate; and a first cutting line is arranged in the first region. The APR plate disclosed by the invention is utilized for making a cutting compensation layer on the surface of the flexible substrate, height of a projection after cutting can be effectively reduced, and the defect that product display is uneven due to GAP enlargement at the projection caused by the projection height is eliminated; meanwhile, the problem that frame</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN107015438A |
source | esp@cenet |
subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | APR plate and application thereof |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T19%3A00%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LIU%20FALIN&rft.date=2017-08-04&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN107015438A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |