Projection system

A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1 - S4); one or more actuators (A1 - A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VALENTIN CHRISTIAAN LOUIS, DE JONGH ROBERTUS JOHANNES MARINUS, BUTLER HANS, VAN SCHOOT JAN BERNARD PLECHELMUS, MERKX LEON LEONARDUS FRANCISCUS, SIMONS WILHELMUS FRANCISCUS JOHANNES, STREEFKERK BOB, YPMA MICHAEL FREDERIK, MERRY ROEL JOHANNES ELISABETH, KNOPS RAOUL MAARTEN SIMON
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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