Negative white photosensitive resin composition and use thereof
The invention relates to a negative white photosensitive resin composition comprising (A) a polysiloxane resin; (B) an ethylenically unsaturated monomer; (C) a photopolymerization initiator; (D) a white pigment; (E) silica; and (F) a solvent. In addition, the present invention further provides the u...
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| creator | CHEN YI HU TENG-KUEI CHANG CHIH-YI TAI FU-SHIANG LIN BO-NAN LAN TAUN CHANG KUEIIA LIN FAN-SEN |
| description | The invention relates to a negative white photosensitive resin composition comprising (A) a polysiloxane resin; (B) an ethylenically unsaturated monomer; (C) a photopolymerization initiator; (D) a white pigment; (E) silica; and (F) a solvent. In addition, the present invention further provides the use of the negative white photosensitive resin composition described above, which is used in a touch panel to form a shielding layer on the periphery of a light-transmissive substrate.
本发明是关于种负型白色感旋光性树脂组合物，包括：(A)聚硅氧烷树脂；(B)乙烯性不饱和基单体；(C)光聚合起始剂；(D)白色颜料；(E)二氧化硅；以及(F)溶剂。此外，本发明更提供了前述负型白色感旋光性树脂组合物的用途，其系用于触控面板中，以在透光基板的周缘上形成遮蔽层。 |
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本发明是关于种负型白色感旋光性树脂组合物，包括：(A)聚硅氧烷树脂；(B)乙烯性不饱和基单体；(C)光聚合起始剂；(D)白色颜料；(E)二氧化硅；以及(F)溶剂。此外，本发明更提供了前述负型白色感旋光性树脂组合物的用途，其系用于触控面板中，以在透光基板的周缘上形成遮蔽层。</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170725&DB=EPODOC&CC=CN&NR=106980236A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170725&DB=EPODOC&CC=CN&NR=106980236A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHEN YI</creatorcontrib><creatorcontrib>HU TENG-KUEI</creatorcontrib><creatorcontrib>CHANG CHIH-YI</creatorcontrib><creatorcontrib>TAI FU-SHIANG</creatorcontrib><creatorcontrib>LIN BO-NAN</creatorcontrib><creatorcontrib>LAN TAUN</creatorcontrib><creatorcontrib>CHANG KUEIIA</creatorcontrib><creatorcontrib>LIN FAN-SEN</creatorcontrib><title>Negative white photosensitive resin composition and use thereof</title><description>The invention relates to a negative white photosensitive resin composition comprising (A) a polysiloxane resin; (B) an ethylenically unsaturated monomer; (C) a photopolymerization initiator; (D) a white pigment; (E) silica; and (F) a solvent. In addition, the present invention further provides the use of the negative white photosensitive resin composition described above, which is used in a touch panel to form a shielding layer on the periphery of a light-transmissive substrate.
本发明是关于种负型白色感旋光性树脂组合物，包括：(A)聚硅氧烷树脂；(B)乙烯性不饱和基单体；(C)光聚合起始剂；(D)白色颜料；(E)二氧化硅；以及(F)溶剂。此外，本发明更提供了前述负型白色感旋光性树脂组合物的用途，其系用于触控面板中，以在透光基板的周缘上形成遮蔽层。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD3S01PLMksS1Uoz8gsSVUoyMgvyS9OzSvOBAsWpRZn5ikk5-cW5INE8vMUEvNSFEqLUxVKMlKLUvPTeBhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvLOfoYGZpYWBkbGZozExagDsTTGm</recordid><startdate>20170725</startdate><enddate>20170725</enddate><creator>CHEN YI</creator><creator>HU TENG-KUEI</creator><creator>CHANG CHIH-YI</creator><creator>TAI FU-SHIANG</creator><creator>LIN BO-NAN</creator><creator>LAN TAUN</creator><creator>CHANG KUEIIA</creator><creator>LIN FAN-SEN</creator><scope>EVB</scope></search><sort><creationdate>20170725</creationdate><title>Negative white photosensitive resin composition and use thereof</title><author>CHEN YI ; HU TENG-KUEI ; CHANG CHIH-YI ; TAI FU-SHIANG ; LIN BO-NAN ; LAN TAUN ; CHANG KUEIIA ; LIN FAN-SEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN106980236A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHEN YI</creatorcontrib><creatorcontrib>HU TENG-KUEI</creatorcontrib><creatorcontrib>CHANG CHIH-YI</creatorcontrib><creatorcontrib>TAI FU-SHIANG</creatorcontrib><creatorcontrib>LIN BO-NAN</creatorcontrib><creatorcontrib>LAN TAUN</creatorcontrib><creatorcontrib>CHANG KUEIIA</creatorcontrib><creatorcontrib>LIN FAN-SEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHEN YI</au><au>HU TENG-KUEI</au><au>CHANG CHIH-YI</au><au>TAI FU-SHIANG</au><au>LIN BO-NAN</au><au>LAN TAUN</au><au>CHANG KUEIIA</au><au>LIN FAN-SEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Negative white photosensitive resin composition and use thereof</title><date>2017-07-25</date><risdate>2017</risdate><abstract>The invention relates to a negative white photosensitive resin composition comprising (A) a polysiloxane resin; (B) an ethylenically unsaturated monomer; (C) a photopolymerization initiator; (D) a white pigment; (E) silica; and (F) a solvent. In addition, the present invention further provides the use of the negative white photosensitive resin composition described above, which is used in a touch panel to form a shielding layer on the periphery of a light-transmissive substrate.
本发明是关于种负型白色感旋光性树脂组合物，包括：(A)聚硅氧烷树脂；(B)乙烯性不饱和基单体；(C)光聚合起始剂；(D)白色颜料；(E)二氧化硅；以及(F)溶剂。此外，本发明更提供了前述负型白色感旋光性树脂组合物的用途，其系用于触控面板中，以在透光基板的周缘上形成遮蔽层。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Negative white photosensitive resin composition and use thereof |
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