Phase mask plate and equipment and method for manufacturing a fiber bragg grating
The invention provides a phase mask plate and equipment and a method for manufacturing a fiber bragg grating. The phase mask plate is used for being arranged in front of a fiber (5), so that an ultraviolet light beam penetrates through interference fringes formed by the phase mask plate (118) to be...
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| creator | HWAYAW TAM APING ZHANG |
| description | The invention provides a phase mask plate and equipment and a method for manufacturing a fiber bragg grating. The phase mask plate is used for being arranged in front of a fiber (5), so that an ultraviolet light beam penetrates through interference fringes formed by the phase mask plate (118) to be hit on a fiber core of the fiber (5) so as to form the fiber bragg grating. The phase mask plate comprises a transparent substrate (1) and a plurality of non-transparent grooves (2) formed in the transparent substrate (1); the grooves (2) are distributed in a fan-shaped grid pattern; the grooves positioned in the middle part of the fan-shaped grid pattern are vertical to the fiber (5); a transmission part (3) is formed between every two adjacent grooves (2), and the ultraviolet light beam penetrates through the transmission parts (3) to form the interference fringes. According to the non-uniform phase mask plate provided by the invention, the period of the interference fringes can be quickly adjusted, the complicat |
| format | Patent |
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The phase mask plate is used for being arranged in front of a fiber (5), so that an ultraviolet light beam penetrates through interference fringes formed by the phase mask plate (118) to be hit on a fiber core of the fiber (5) so as to form the fiber bragg grating. The phase mask plate comprises a transparent substrate (1) and a plurality of non-transparent grooves (2) formed in the transparent substrate (1); the grooves (2) are distributed in a fan-shaped grid pattern; the grooves positioned in the middle part of the fan-shaped grid pattern are vertical to the fiber (5); a transmission part (3) is formed between every two adjacent grooves (2), and the ultraviolet light beam penetrates through the transmission parts (3) to form the interference fringes. 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The phase mask plate is used for being arranged in front of a fiber (5), so that an ultraviolet light beam penetrates through interference fringes formed by the phase mask plate (118) to be hit on a fiber core of the fiber (5) so as to form the fiber bragg grating. The phase mask plate comprises a transparent substrate (1) and a plurality of non-transparent grooves (2) formed in the transparent substrate (1); the grooves (2) are distributed in a fan-shaped grid pattern; the grooves positioned in the middle part of the fan-shaped grid pattern are vertical to the fiber (5); a transmission part (3) is formed between every two adjacent grooves (2), and the ultraviolet light beam penetrates through the transmission parts (3) to form the interference fringes. 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The phase mask plate is used for being arranged in front of a fiber (5), so that an ultraviolet light beam penetrates through interference fringes formed by the phase mask plate (118) to be hit on a fiber core of the fiber (5) so as to form the fiber bragg grating. The phase mask plate comprises a transparent substrate (1) and a plurality of non-transparent grooves (2) formed in the transparent substrate (1); the grooves (2) are distributed in a fan-shaped grid pattern; the grooves positioned in the middle part of the fan-shaped grid pattern are vertical to the fiber (5); a transmission part (3) is formed between every two adjacent grooves (2), and the ultraviolet light beam penetrates through the transmission parts (3) to form the interference fringes. According to the non-uniform phase mask plate provided by the invention, the period of the interference fringes can be quickly adjusted, the complicat</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Phase mask plate and equipment and method for manufacturing a fiber bragg grating |
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