Double-nozzle triangle glue-spraying method

The invention belong to the technical field of a gluing process in the semiconductor integrated circuit manufacturing process, and specifically relates to a double-nozzle triangle glue-spraying method. The double-nozzle triangle glue-spraying method comprises a first step of placing a wafer on a supporting desk; a second step of making a first glue nozzle and a second glue nozzle reciprocate from the central position of the wafer to two sides to form triangle glue spraying loci, beginning to spray photoresist until the first glue nozzle and the second glue nozzle move to the edges of the wafer, and finishing the glue spraying. According to the invention, the photoresist spraying time can be effectively shortened, and therefore the capacity of equipment is improved. 本发明属于半导体集成电路制造工艺中涂胶工艺技术领域，具体地说是种双喷嘴三角形喷胶方法。该方法包括以下几个步骤：第步骤，将晶圆放置在承载台上；第二步骤，第胶嘴和第二胶嘴从晶圆的中心位置分别向两侧以三角形喷胶轨迹往复移动，同时开始喷涂光刻胶，直至移动到晶圆的边缘，喷胶结束。本发明可以有效缩短光刻胶喷涂时间，从而提高设备的产能。