Yarn evenness measuring system based on yarn section perimeter

The invention relates to a yarn evenness measuring system based on yarn section perimeter. Nonuniform yarn appearance evenness is understood from the perspective of the relation between yarn and fabric. The technology is based on an elliptical yarn section model, a double-axial CCD camera is used fo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHAO QIANG, WANG JUN, HUO SHUHUAI, LI GUANZHI, YANG XUAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR LAUNDERING MARKING, INSPECTING, SEAMING OR SEVERING TEXTILE MATERIALS TEXTILES TREATMENT OF TEXTILES OR THE LIKE
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