Integrated inductor structure and manufacture method thereof
The invention relates to an integrated inductor structure. The integrated inductor structure comprises a capacitor, a guard ring, a pattern type protective layer and an inductor, wherein the guard ring is coupled to the capacitor, the pattern type protective layer is coupled to the guard ring throug...
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| creator | HSIAO-TSUNG YEN CHIA-JUI LIANG |
| description | The invention relates to an integrated inductor structure. The integrated inductor structure comprises a capacitor, a guard ring, a pattern type protective layer and an inductor, wherein the guard ring is coupled to the capacitor, the pattern type protective layer is coupled to the guard ring through the capacitor so as to be connected in a floating manner, and the inductor is arranged on the guard ring and the pattern type protective layer.
种积体电感结构，其包含电容、保护环、图案式防护层及电感。保护环(guard ring)耦接于电容。图案式防护层透过电容耦接于保护环，使得图案式防护层浮接。电感配置于保护环与图案式防护层之上。 |
| format | Patent |
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种积体电感结构，其包含电容、保护环、图案式防护层及电感。保护环(guard ring)耦接于电容。图案式防护层透过电容耦接于保护环，使得图案式防护层浮接。电感配置于保护环与图案式防护层之上。</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161005&DB=EPODOC&CC=CN&NR=105990311A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161005&DB=EPODOC&CC=CN&NR=105990311A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HSIAO-TSUNG YEN</creatorcontrib><creatorcontrib>CHIA-JUI LIANG</creatorcontrib><title>Integrated inductor structure and manufacture method thereof</title><description>The invention relates to an integrated inductor structure. The integrated inductor structure comprises a capacitor, a guard ring, a pattern type protective layer and an inductor, wherein the guard ring is coupled to the capacitor, the pattern type protective layer is coupled to the guard ring through the capacitor so as to be connected in a floating manner, and the inductor is arranged on the guard ring and the pattern type protective layer.
种积体电感结构，其包含电容、保护环、图案式防护层及电感。保护环(guard ring)耦接于电容。图案式防护层透过电容耦接于保护环，使得图案式防护层浮接。电感配置于保护环与图案式防护层之上。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDxzCtJTS9KLElNUcjMSylNLskvUiguKQIySotSFRLzUhRyE_NK0xIh_NzUkoz8FIWSjNSi1Pw0HgbWtMSc4lReKM3NoOjmGuLsoZtakB-fWlyQmJyal1oS7-xnaGBqaWlgbGjoaEyMGgA9UjB5</recordid><startdate>20161005</startdate><enddate>20161005</enddate><creator>HSIAO-TSUNG YEN</creator><creator>CHIA-JUI LIANG</creator><scope>EVB</scope></search><sort><creationdate>20161005</creationdate><title>Integrated inductor structure and manufacture method thereof</title><author>HSIAO-TSUNG YEN ; CHIA-JUI LIANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN105990311A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HSIAO-TSUNG YEN</creatorcontrib><creatorcontrib>CHIA-JUI LIANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HSIAO-TSUNG YEN</au><au>CHIA-JUI LIANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Integrated inductor structure and manufacture method thereof</title><date>2016-10-05</date><risdate>2016</risdate><abstract>The invention relates to an integrated inductor structure. The integrated inductor structure comprises a capacitor, a guard ring, a pattern type protective layer and an inductor, wherein the guard ring is coupled to the capacitor, the pattern type protective layer is coupled to the guard ring through the capacitor so as to be connected in a floating manner, and the inductor is arranged on the guard ring and the pattern type protective layer.
种积体电感结构，其包含电容、保护环、图案式防护层及电感。保护环(guard ring)耦接于电容。图案式防护层透过电容耦接于保护环，使得图案式防护层浮接。电感配置于保护环与图案式防护层之上。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Integrated inductor structure and manufacture method thereof |
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