Selective Formation of Conductor Nanowires

The invention provides a method which includes etching a mandrel layer to form mandrel strips, and selectively depositing metal lines on sidewalls of the mandrel strips. During the selective deposition, top surfaces of the mandrel strips are masked by dielectric masks. The method further includes re...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHAU-LIN SHUE, HSIANG-HUAN LEE, CHAO-HSIEN PENG
Format: Patent
Sprache:eng
Schlagworte:
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