Photo-destroyable quencher and associated photoresist composition, and device-forming method

A photo-destroyable quencher has the structure wherein X, n, and R1-R6 are defined herein, and at least one of R2, R3, R4, R5, and R6 is halogen, nitro, C1-12 fluorinated alkyl, cyano, aldehyde, C2-20 ester, C2-20 ketone, C1-20 sulfoxyl hydrocarbyl, C1-20 sulfonyl hydrocarbyl, or sulfonamide. The ph...

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Bibliographische Detailangaben
1. Verfasser:	LABEAUME, PAUL J
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A photo-destroyable quencher has the structure wherein X, n, and R1-R6 are defined herein, and at least one of R2, R3, R4, R5, and R6 is halogen, nitro, C1-12 fluorinated alkyl, cyano, aldehyde, C2-20 ester, C2-20 ketone, C1-20 sulfoxyl hydrocarbyl, C1-20 sulfonyl hydrocarbyl, or sulfonamide. The photo-destroyable quencher exhibits improved solution stability and reduced hygroscopic properties relative to triphenylsulfonium phenolate. A photoresist composition including an acid-sensitive polymer, a photoacid generator, and the photo-destroyable quencher exhibits increased contrast and/or critical dimension uniformity relative to corresponding photoresist compositions comparative photo-destroyable quenchers.