Contacts for semiconductor devices and methods of forming thereof

A method for a method of forming a semiconductor device includes providing a semiconductor substrate having a bottom surface opposite a top surface with circuitry disposed at the top surface. The method further includes forming a first metal layer having a first metal over the bottom surface of the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SPORN MARTIN, HARRISON MARK JAMES
Format: Patent
Sprache:eng
Schlagworte:
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