Method for improving vertical-conductive structured SiC MOSFET (Metal-Oxide -Semiconductor Field Effect Transistor) channel mobility

An embodiment of the invention relates to a method for improving the vertical-conductive structured SiC MOSFET (Metal-Oxide -Semiconductor Field Effect Transistor) channel mobility. The method comprises steps of forming an N-drift region of a MOSFET on an N+SiC substrate through the epitaxial techno...

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Bibliographische Detailangaben
Hauptverfasser: ZHANG YUMING, LYU HONGLIANG, JIA RENXU, WANG YUCHENG
Format: Patent
Sprache:eng
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