Method for preparing cuprous-oxide photoelectric film through copper sulphate

The invention discloses a method for preparing a cuprous-oxide photoelectric film through copper sulphate, and belongs to the technical field of photoelectric films. The method comprises the following steps: washing a substrate; placing copper sulphate and sodium citrate into a solvent; employing an electro-deposition method to achieve constant-potential deposition on a stannic oxide conducting glass substrate; finally carrying out washing and cleaning, thereby obtaining the cuprous-oxide photoelectric film. The method does not need high temperature and high-vacuum conditions, exerts low requirements for instrument equipment, is low in production cost, is high in production efficiency, and is easy to operate. The obtained cuprous-oxide photoelectric film is better in continuity and uniformity, and the new technology is easy for the control of the components and structure of a target product, and provides a low-cost method, which can achieve the industrialization, for preparing a high-performance cuprous-oxide photoelectric film.