Sidewall Passivation for HEMT Devices

Some embodiments of the present disclosure relate to a high electron mobility transistor (HEMT) which includes a heterojunction structure arranged over a semiconductor substrate. The heterojunction structure includes a binary III/V semiconductor layer made of a first III-nitride material to act as a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHI-MING CHEN, FU-WEI YAO, CHENG-YUAN TSAI, HANIN CHIU
Format: Patent
Sprache:eng
Schlagworte:
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