Method for producing nanosilicon dioxide and by-product hydrochloric acid through chlorosilane waste gas

The invention discloses a method for producing nanosilicon dioxide and by-product hydrochloric acid through chlorosilane waste gas, and belongs to the field of chlorosilane waste gas recycling in the polycrystalline silicon industry. The method includes the steps that chlorosilane waste gas and wate...

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Bibliographische Detailangaben

Hauptverfasser:	ZHANG WENWEN, SONG LIANGJIE, XU LINGTONG, WANG LING, MA QIKUN, DING BINGHENG, LUO PING, SHEN ZONGXI, HE XUEBIAO, ZHAO YI, LIANG JINGKUN, WANG GUANGYUE, SONG DONGMING, CHEN LIANG, ZHANG JIANGHONG, LIANG YONGKUN, HUANG BING, LI YINGUANG, DENG LIANG, DONG SENLIN
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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