Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition
Provided are a monomer for a hardmask composition which is represented by chemical formula 1, a hardmask composition comprising the monomer and a pattern forming method using the hardmask composition.
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| creator | LEE SUNG-JAE MOON JOON-YOUNG LEE CHUL-HO PARK YOU-JUNG YOON YONG-WOON CHO YOUN-JIN |
| description | Provided are a monomer for a hardmask composition which is represented by chemical formula 1, a hardmask composition comprising the monomer and a pattern forming method using the hardmask composition. |
| format | Patent |
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| language | eng |
| recordid | cdi_epo_espacenet_CN105026389A |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HETEROCYCLIC COMPOUNDS HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS |
| title | Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition |
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