Highly-conductive aluminum alloy film and production method thereof

The invention relates to a highly-conductive aluminum alloy film and a production method thereof. The chemical composition of the highly-conductive aluminum alloy film is Al-Sn-X, wherein X is one or more of Fe, Ni, Zn and Si elements. The resistivity of the aluminum alloy film at 25DEG C is 1.7-2.1...

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Bibliographische Detailangaben
Hauptverfasser:	ZHENG ZENG, NIU JUNCHAO, ZHANG YONG, YAN BIAO, ZHAO GUANNAN
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a highly-conductive aluminum alloy film and a production method thereof. The chemical composition of the highly-conductive aluminum alloy film is Al-Sn-X, wherein X is one or more of Fe, Ni, Zn and Si elements. The resistivity of the aluminum alloy film at 25DEG C is 1.7-2.1[mu]omega.cm, and the highly-conductive aluminum alloy film is produced through production of a nanocrystalline aluminum alloy film and heat treatment of the nanocrystalline aluminum alloy film. Compared with the prior art, the method disclosed in the invention greatly improves the conductive performance of the aluminum alloy film through introducing the alloy element Sn and adopting a simple processing technology and cheap alloy elements, so the highly-conductive aluminum alloy film can be widely applied in the field of semiconductor connecting pieces and the field of liquid crystal display.