INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD

The present invention relates to an inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. In order to determine whether an exposure apparatus is outputting the correct dose of radiation and a projection system of the exposure apparatus...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CRAMER HUGO, HINNEN PAUL
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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