Image quality compensation mechanism used for photoetching equipment projection objective
The invention discloses a catadioptric objective image quality compensation mechanism used for photoetching equipment. The catadioptric objective image quality compensation mechanism is characterized in comprising an image quality compensation mechanism used for compensating projection image quality...
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| creator | LIANG RENCHENG CAO CHANGZHI |
| description | The invention discloses a catadioptric objective image quality compensation mechanism used for photoetching equipment. The catadioptric objective image quality compensation mechanism is characterized in comprising an image quality compensation mechanism used for compensating projection image quality. Compared with the prior art, the catadioptric objective image quality compensation mechanism is capable of realizing, 1, simultaneous detection on surface type and temperature of compensation reflector reflecting surfaces; 2, detection on surface type of reflecting surfaces used at present, and adjusting accuracy increasing via closed-loop control, and at the same time compensation reflector surface type is controlled; 3, direct detection on surface type of reflecting surfaces, and behind compensation, so that a complex honeycomb structure is not needed. |
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The catadioptric objective image quality compensation mechanism is characterized in comprising an image quality compensation mechanism used for compensating projection image quality. Compared with the prior art, the catadioptric objective image quality compensation mechanism is capable of realizing, 1, simultaneous detection on surface type and temperature of compensation reflector reflecting surfaces; 2, detection on surface type of reflecting surfaces used at present, and adjusting accuracy increasing via closed-loop control, and at the same time compensation reflector surface type is controlled; 3, direct detection on surface type of reflecting surfaces, and behind compensation, so that a complex honeycomb structure is not needed.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150715&DB=EPODOC&CC=CN&NR=104777717A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150715&DB=EPODOC&CC=CN&NR=104777717A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIANG RENCHENG</creatorcontrib><creatorcontrib>CAO CHANGZHI</creatorcontrib><title>Image quality compensation mechanism used for photoetching equipment projection objective</title><description>The invention discloses a catadioptric objective image quality compensation mechanism used for photoetching equipment. The catadioptric objective image quality compensation mechanism is characterized in comprising an image quality compensation mechanism used for compensating projection image quality. Compared with the prior art, the catadioptric objective image quality compensation mechanism is capable of realizing, 1, simultaneous detection on surface type and temperature of compensation reflector reflecting surfaces; 2, detection on surface type of reflecting surfaces used at present, and adjusting accuracy increasing via closed-loop control, and at the same time compensation reflector surface type is controlled; 3, direct detection on surface type of reflecting surfaces, and behind compensation, so that a complex honeycomb structure is not needed.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7EKwjAURbM4iPoPzw8QLAqdpSi6OLk4lRhvm5TmvbRJBP9eKX6AdzlnOHeu7hevW9CQde_Sm4z4AI46OWHyMFazi55yxJMaGSlYSYJkrOOWMGQXPDhRGKWDmU7ymOyFpZo1uo9Y_bhQ69PxVp03CFIjBm3ASHV1Lbb78ruiPOz-aT58LDv3</recordid><startdate>20150715</startdate><enddate>20150715</enddate><creator>LIANG RENCHENG</creator><creator>CAO CHANGZHI</creator><scope>EVB</scope></search><sort><creationdate>20150715</creationdate><title>Image quality compensation mechanism used for photoetching equipment projection objective</title><author>LIANG RENCHENG ; CAO CHANGZHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN104777717A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>LIANG RENCHENG</creatorcontrib><creatorcontrib>CAO CHANGZHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIANG RENCHENG</au><au>CAO CHANGZHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Image quality compensation mechanism used for photoetching equipment projection objective</title><date>2015-07-15</date><risdate>2015</risdate><abstract>The invention discloses a catadioptric objective image quality compensation mechanism used for photoetching equipment. The catadioptric objective image quality compensation mechanism is characterized in comprising an image quality compensation mechanism used for compensating projection image quality. Compared with the prior art, the catadioptric objective image quality compensation mechanism is capable of realizing, 1, simultaneous detection on surface type and temperature of compensation reflector reflecting surfaces; 2, detection on surface type of reflecting surfaces used at present, and adjusting accuracy increasing via closed-loop control, and at the same time compensation reflector surface type is controlled; 3, direct detection on surface type of reflecting surfaces, and behind compensation, so that a complex honeycomb structure is not needed.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Image quality compensation mechanism used for photoetching equipment projection objective |
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