IMAGING THREE DIMENSIONAL SUBSTRATES USING A TRANSFER FILM
Imaging three dimensional substrate using a transfer film. Methods include: selectively inkjetting a resist composition including one or more waxes, one or more acrylate functional monomers free of acid groups and one or more radical initiators adjacent a first surface of an actinic radiation transp...
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| creator | AMOS BRIAN D BARR ROBERT K BALANTRAPU KRISHNA |
| description | Imaging three dimensional substrate using a transfer film. Methods include: selectively inkjetting a resist composition including one or more waxes, one or more acrylate functional monomers free of acid groups and one or more radical initiators adjacent a first surface of an actinic radiation transparent flexible film; applying the actinic radiation transparent flexible film with the resist composition to a surface of a three dimensional substrate, the first surface of the actinic radiation transparent flexible film with the resist composition adjacent the surface of the three dimensional substrate and the actinic radiation transparent flexible film follows contours of the surface of the three dimensional substrate; applying actinic radiation to a second surface of the actinic radiation transparent flexible film opposite the first surface with the resist composition to cure the resist composition; and separating the actinic radiation transparent flexible film from the cured resist composition with the cured composition adhering to the surface of the three dimensional substrate. |
| format | Patent |
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Methods include: selectively inkjetting a resist composition including one or more waxes, one or more acrylate functional monomers free of acid groups and one or more radical initiators adjacent a first surface of an actinic radiation transparent flexible film; applying the actinic radiation transparent flexible film with the resist composition to a surface of a three dimensional substrate, the first surface of the actinic radiation transparent flexible film with the resist composition adjacent the surface of the three dimensional substrate and the actinic radiation transparent flexible film follows contours of the surface of the three dimensional substrate; applying actinic radiation to a second surface of the actinic radiation transparent flexible film opposite the first surface with the resist composition to cure the resist composition; and separating the actinic radiation transparent flexible film from the cured resist composition with the cured composition adhering to the surface of the three dimensional substrate.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150701&DB=EPODOC&CC=CN&NR=104749877A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150701&DB=EPODOC&CC=CN&NR=104749877A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AMOS BRIAN D</creatorcontrib><creatorcontrib>BARR ROBERT K</creatorcontrib><creatorcontrib>BALANTRAPU KRISHNA</creatorcontrib><title>IMAGING THREE DIMENSIONAL SUBSTRATES USING A TRANSFER FILM</title><description>Imaging three dimensional substrate using a transfer film. 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | IMAGING THREE DIMENSIONAL SUBSTRATES USING A TRANSFER FILM |
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