Forming method for semiconductor device and grid electrode

The invention provides a forming method for a semiconductor device and a grid electrode. In the forming method of the semiconductor device, photoresist layers are subjected to patterning for forming photoresist patterns, the photoresist patterns are subjected to softening procesing process, and the...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SUI YUNQI, MENG XIAOYING
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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