Compound semiconductor substrate, semiconductor device, and processes for producing them

The invention provides a compound semiconductor substrate, a semiconductor device, and processes for producing them. The compound semiconductor substrate 10 according to the present invention is comprised of a Group III nitride and has a surface layer 12 containing a chloride of not less than 200101...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KEIJI ISHIBASHI, FUMITAKE NAKANISHI
Format: Patent
Sprache:eng
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