Substrate processing system having function for preventing damage
The present invention relates to a substrate processing system having a function for preventing damage. A substrate processing system having a function for preventing damage, according to the present invention, comprises: a fluid tank for storing fluid; a chamber which is supplied with the fluid fro...
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| creator | OH HYUN-PIL JEON KWANG-JIN LEE DONG-HYUN PARK SANG-HYUN KWON JIN-HAON PARK SUNG-JIN |
| description | The present invention relates to a substrate processing system having a function for preventing damage. A substrate processing system having a function for preventing damage, according to the present invention, comprises: a fluid tank for storing fluid; a chamber which is supplied with the fluid from the fluid tank and provides a space in which a substrate is processed; a pipe which connects the fluid tank and the chamber to each other such that the fluid can flow therethrough; and a damage prevention unit capable of changing the position of the fluid tank in response to thermal expansion which is generated by the supply of heat due to the movement of the fluid in the pipe. Therefore, a substrate processing system, having a function for preventing damage, which can prevent damage to the fluid tank corresponding to changes in volume resulting from the thermal expansion of the pipe is provided. |
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A substrate processing system having a function for preventing damage, according to the present invention, comprises: a fluid tank for storing fluid; a chamber which is supplied with the fluid from the fluid tank and provides a space in which a substrate is processed; a pipe which connects the fluid tank and the chamber to each other such that the fluid can flow therethrough; and a damage prevention unit capable of changing the position of the fluid tank in response to thermal expansion which is generated by the supply of heat due to the movement of the fluid in the pipe. Therefore, a substrate processing system, having a function for preventing damage, which can prevent damage to the fluid tank corresponding to changes in volume resulting from the thermal expansion of the pipe is provided.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150225&DB=EPODOC&CC=CN&NR=104380485A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150225&DB=EPODOC&CC=CN&NR=104380485A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OH HYUN-PIL</creatorcontrib><creatorcontrib>JEON KWANG-JIN</creatorcontrib><creatorcontrib>LEE DONG-HYUN</creatorcontrib><creatorcontrib>PARK SANG-HYUN</creatorcontrib><creatorcontrib>KWON JIN-HAON</creatorcontrib><creatorcontrib>PARK SUNG-JIN</creatorcontrib><title>Substrate processing system having function for preventing damage</title><description>The present invention relates to a substrate processing system having a function for preventing damage. A substrate processing system having a function for preventing damage, according to the present invention, comprises: a fluid tank for storing fluid; a chamber which is supplied with the fluid from the fluid tank and provides a space in which a substrate is processed; a pipe which connects the fluid tank and the chamber to each other such that the fluid can flow therethrough; and a damage prevention unit capable of changing the position of the fluid tank in response to thermal expansion which is generated by the supply of heat due to the movement of the fluid in the pipe. Therefore, a substrate processing system, having a function for preventing damage, which can prevent damage to the fluid tank corresponding to changes in volume resulting from the thermal expansion of the pipe is provided.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAMLk0qLilKLElVKCjKT04tLs7MS1coriwuSc1VyEgsA_HSSvOSSzLz8xTS8ouAqlLLUvNKQOIpibmJ6ak8DKxpiTnFqbxQmptB0c01xNlDN7UgPz61uCAxOTUvtSTe2c_QwMTYwsDEwtTRmBg1AGxsMnQ</recordid><startdate>20150225</startdate><enddate>20150225</enddate><creator>OH HYUN-PIL</creator><creator>JEON KWANG-JIN</creator><creator>LEE DONG-HYUN</creator><creator>PARK SANG-HYUN</creator><creator>KWON JIN-HAON</creator><creator>PARK SUNG-JIN</creator><scope>EVB</scope></search><sort><creationdate>20150225</creationdate><title>Substrate processing system having function for preventing damage</title><author>OH HYUN-PIL ; JEON KWANG-JIN ; LEE DONG-HYUN ; PARK SANG-HYUN ; KWON JIN-HAON ; PARK SUNG-JIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN104380485A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>OH HYUN-PIL</creatorcontrib><creatorcontrib>JEON KWANG-JIN</creatorcontrib><creatorcontrib>LEE DONG-HYUN</creatorcontrib><creatorcontrib>PARK SANG-HYUN</creatorcontrib><creatorcontrib>KWON JIN-HAON</creatorcontrib><creatorcontrib>PARK SUNG-JIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OH HYUN-PIL</au><au>JEON KWANG-JIN</au><au>LEE DONG-HYUN</au><au>PARK SANG-HYUN</au><au>KWON JIN-HAON</au><au>PARK SUNG-JIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate processing system having function for preventing damage</title><date>2015-02-25</date><risdate>2015</risdate><abstract>The present invention relates to a substrate processing system having a function for preventing damage. A substrate processing system having a function for preventing damage, according to the present invention, comprises: a fluid tank for storing fluid; a chamber which is supplied with the fluid from the fluid tank and provides a space in which a substrate is processed; a pipe which connects the fluid tank and the chamber to each other such that the fluid can flow therethrough; and a damage prevention unit capable of changing the position of the fluid tank in response to thermal expansion which is generated by the supply of heat due to the movement of the fluid in the pipe. Therefore, a substrate processing system, having a function for preventing damage, which can prevent damage to the fluid tank corresponding to changes in volume resulting from the thermal expansion of the pipe is provided.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING |
| title | Substrate processing system having function for preventing damage |
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