Illumination optical unit for projection lithography

An illumination optical unit (32) for projection lithography serves for illuminating an object field (5), in which an object to be imaged can be arranged, with illumination light (14). The illumination optical unit has a collector for collecting the emission of a light source for the illumination li...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MAUL MANFRED
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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