METHODS AND SYSTEMS FOR DESIGNING AND MANUFACTURING OPTICAL LITHOGRAPHY MASKS

The present invention relates to methods and systems for designing and manufacturing optical lithography masks. The method includes providing a target pattern, correcting the target pattern with an OPC model, adjusting the target pattern and/or the OPC model, and correcting a first corrected pattern...

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Bibliographische Detailangaben
Hauptverfasser:	TODD P. LUKANC, PIYUSH VERMA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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