Method for restraining formation and growth of spirogyra on water surfaces

Method for restraining formation and growth of spirogyra on water surfaces

The invention provides a method for restraining the formation and growth of spirogyra on water surfaces. The method is characterized by comprising the following steps: when the daylight intensity is 2500-5000 lux, and water temperature is 7-25 DEG C, chlorine dioxide with the concentration of 2.3-4....

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Hauptverfasser: ZHANG YINJIANG, HUA RENFENG, CHEN XIAOJUN, PENG QUNZHOU, WANG FANG, ZHAI SIFAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
CHEMISTRY
METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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creator ZHANG YINJIANG
HUA RENFENG
CHEN XIAOJUN
PENG QUNZHOU
WANG FANG
ZHAI SIFAN
description The invention provides a method for restraining the formation and growth of spirogyra on water surfaces. The method is characterized by comprising the following steps: when the daylight intensity is 2500-5000 lux, and water temperature is 7-25 DEG C, chlorine dioxide with the concentration of 2.3-4.5 mg/L is splashed or put on the water surfaces of water bodies of ponds, ditches, or lakes, in which a large amount of spirogyra grows, for 2-3 times with the time interval of 5 minutes, so as to enable the chlorine dioxide to be in full contact with the spirogyra on the water surfaces for 10-15 minutes, the structure of the spirogyra is damaged, and finally, the spirogyra degrades automatically until disappearing. Therefore, the purposes of restraining the formation and growth of spirogyra on the water surfaces are achieved, and that a large amount of spirogyra breeds is controlled. The method provided by the invention is suitable for restraining the formation and growth of spirogyra on the water surfaces of wate
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METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
title Method for restraining formation and growth of spirogyra on water surfaces
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