Resist film forming apparatus, resist film forming method, and mold original plate production method

The invention provides a resist film forming apparatus, a resist film forming method, and a mold original plate production method. The resist film forming apparatus includes a coating unit configured to drop, rotate, and spread a resist while rotating a substrate, a heating unit configured to heat a...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	JOZAKI TOMOHIDE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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