Airflow balancing plate, chamber device and substrate processing device

The invention discloses an airflow balancing assembly, a chamber device and a substrate processing device. The airflow balancing assembly comprises a first annular plate and a second annular plate, wherein the first annular plate is provided with a first opening; a plurality of through holes are formed in the first annular plate; the second annular plate is provided with a second opening and is arranged on the first annular plate in an adjustable manner for partially shielding the plurality of the through holes in the first annular plate; the radial width of the second annular plate is changed along the circumferential direction of the second annular plate, so that the areas of the plurality of the through holes shielded by the second annular plate are changed along the circumferential direction of the first annular plate. The air balancing assembly provided by the embodiment of the invention is beneficial to improving the air distribution uniformity, and can improve the processing uniformity of the substrate