Washing agent and washing method of solar wafer

Disclosed are a washing agent and a washing method of solar wafer. The washing agent includes alcohol ether carboxylate compound and solvent for diluting the alcohol ether carboxylate compound. The washing agent is suitable for washing off particles and dirt on the wafer surface after wire sawing.

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Bibliographische Detailangaben
Hauptverfasser: LU HOUDE, ZHANG SHUNJI
Format: Patent
Sprache:chi ; eng
Schlagworte:
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