Substrate, method for exposure of substrate to light, and photo-alignment treatment method
Disclosed are: a substrate in which all of regions to be exposed to light can be irradiated with a light energy with high accuracy; and a light exposure method. Using a light exposure device (5) that is equipped with multiple light exposure units (52) each comprising a light source (521) and a mask...
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| creator | HIRAKO TAKAHIRO |
| description | Disclosed are: a substrate in which all of regions to be exposed to light can be irradiated with a light energy with high accuracy; and a light exposure method. Using a light exposure device (5) that is equipped with multiple light exposure units (52) each comprising a light source (521) and a mask (522) having, formed therein, a light-transmissive pattern (5221) that can transmit a light energy emitted from the light source (521), a substrate (1) is irradiated with the light energy through the light-transmissive pattern (5221) formed in the mask (522) while moving the substrate (1) and the light exposure units (52) relatively to each other. At the same time, in one of the light exposure units (52) in which the mask (522) straddles a display region (11a) having a predetermined size and a display region (11b) having a different size from the predetermined size, both the display region (11a) having the predetermined size and the display region (11b) having the different size are irradiated with the light energy |
| format | Patent |
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Using a light exposure device (5) that is equipped with multiple light exposure units (52) each comprising a light source (521) and a mask (522) having, formed therein, a light-transmissive pattern (5221) that can transmit a light energy emitted from the light source (521), a substrate (1) is irradiated with the light energy through the light-transmissive pattern (5221) formed in the mask (522) while moving the substrate (1) and the light exposure units (52) relatively to each other. At the same time, in one of the light exposure units (52) in which the mask (522) straddles a display region (11a) having a predetermined size and a display region (11b) having a different size from the predetermined size, both the display region (11a) having the predetermined size and the display region (11b) having the different size are irradiated with the light energy</description><language>chi ; eng</language><subject>ADVERTISING ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; CRYPTOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; DISPLAY ; DISPLAYING ; EDUCATION ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; LABELS OR NAME-PLATES ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEALS ; SIGNS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20121010&DB=EPODOC&CC=CN&NR=102725680A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20121010&DB=EPODOC&CC=CN&NR=102725680A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIRAKO TAKAHIRO</creatorcontrib><title>Substrate, method for exposure of substrate to light, and photo-alignment treatment method</title><description>Disclosed are: a substrate in which all of regions to be exposed to light can be irradiated with a light energy with high accuracy; and a light exposure method. 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At the same time, in one of the light exposure units (52) in which the mask (522) straddles a display region (11a) having a predetermined size and a display region (11b) having a different size from the predetermined size, both the display region (11a) having the predetermined size and the display region (11b) having the different size are irradiated with the light energy</description><subject>ADVERTISING</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>CRYPTOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>DISPLAY</subject><subject>DISPLAYING</subject><subject>EDUCATION</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>LABELS OR NAME-PLATES</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEALS</subject><subject>SIGNS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgKLk0qLilKLEnVUchNLcnIT1FIyy9SSK0oyC8uLUpVyE9TKIapUCjJV8jJTM8o0VFIzEtRKMjIL8nXTQSK5OWm5pUolBSlJpaAWRCDeBhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvLOfoYGRuZGpmYWBozExagA9PTtC</recordid><startdate>20121010</startdate><enddate>20121010</enddate><creator>HIRAKO TAKAHIRO</creator><scope>EVB</scope></search><sort><creationdate>20121010</creationdate><title>Substrate, method for exposure of substrate to light, and photo-alignment treatment method</title><author>HIRAKO TAKAHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN102725680A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2012</creationdate><topic>ADVERTISING</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>CRYPTOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>DISPLAY</topic><topic>DISPLAYING</topic><topic>EDUCATION</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>LABELS OR NAME-PLATES</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEALS</topic><topic>SIGNS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>HIRAKO TAKAHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIRAKO TAKAHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate, method for exposure of substrate to light, and photo-alignment treatment method</title><date>2012-10-10</date><risdate>2012</risdate><abstract>Disclosed are: a substrate in which all of regions to be exposed to light can be irradiated with a light energy with high accuracy; and a light exposure method. Using a light exposure device (5) that is equipped with multiple light exposure units (52) each comprising a light source (521) and a mask (522) having, formed therein, a light-transmissive pattern (5221) that can transmit a light energy emitted from the light source (521), a substrate (1) is irradiated with the light energy through the light-transmissive pattern (5221) formed in the mask (522) while moving the substrate (1) and the light exposure units (52) relatively to each other. At the same time, in one of the light exposure units (52) in which the mask (522) straddles a display region (11a) having a predetermined size and a display region (11b) having a different size from the predetermined size, both the display region (11a) having the predetermined size and the display region (11b) having the different size are irradiated with the light energy</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN102725680A |
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| subjects | ADVERTISING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CRYPTOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DISPLAY DISPLAYING EDUCATION ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY LABELS OR NAME-PLATES MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEALS SIGNS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | Substrate, method for exposure of substrate to light, and photo-alignment treatment method |
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