Photo mask and positioning method of photo mask

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Hauptverfasser:	WEI XIAODAN, ZHANG TONGJU, JIANG JUNBO, XIONG ZHENGPING, SUN XUEJIA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	WEI XIAODAN ZHANG TONGJU JIANG JUNBO XIONG ZHENGPING SUN XUEJIA
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format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN102650819BB</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN102650819BB</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN102650819BB3</originalsourceid><addsrcrecordid>eNrjZNAPyMgvyVfITSzOVkjMS1EoyC_OLMnMz8vMS1fITS3JyE9RyE9TKIAr4mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8c5-hgZGZqYGFoaWTk7GRCkCAHAVK0Y</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Photo mask and positioning method of photo mask</title><source>esp@cenet</source><creator>WEI XIAODAN ; ZHANG TONGJU ; JIANG JUNBO ; XIONG ZHENGPING ; SUN XUEJIA</creator><creatorcontrib>WEI XIAODAN ; ZHANG TONGJU ; JIANG JUNBO ; XIONG ZHENGPING ; SUN XUEJIA</creatorcontrib><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140702&DB=EPODOC&CC=CN&NR=102650819B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140702&DB=EPODOC&CC=CN&NR=102650819B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WEI XIAODAN</creatorcontrib><creatorcontrib>ZHANG TONGJU</creatorcontrib><creatorcontrib>JIANG JUNBO</creatorcontrib><creatorcontrib>XIONG ZHENGPING</creatorcontrib><creatorcontrib>SUN XUEJIA</creatorcontrib><title>Photo mask and positioning method of photo mask</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAPyMgvyVfITSzOVkjMS1EoyC_OLMnMz8vMS1fITS3JyE9RyE9TKIAr4mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8c5-hgZGZqYGFoaWTk7GRCkCAHAVK0Y</recordid><startdate>20140702</startdate><enddate>20140702</enddate><creator>WEI XIAODAN</creator><creator>ZHANG TONGJU</creator><creator>JIANG JUNBO</creator><creator>XIONG ZHENGPING</creator><creator>SUN XUEJIA</creator><scope>EVB</scope></search><sort><creationdate>20140702</creationdate><title>Photo mask and positioning method of photo mask</title><author>WEI XIAODAN ; ZHANG TONGJU ; JIANG JUNBO ; XIONG ZHENGPING ; SUN XUEJIA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN102650819BB3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WEI XIAODAN</creatorcontrib><creatorcontrib>ZHANG TONGJU</creatorcontrib><creatorcontrib>JIANG JUNBO</creatorcontrib><creatorcontrib>XIONG ZHENGPING</creatorcontrib><creatorcontrib>SUN XUEJIA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WEI XIAODAN</au><au>ZHANG TONGJU</au><au>JIANG JUNBO</au><au>XIONG ZHENGPING</au><au>SUN XUEJIA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photo mask and positioning method of photo mask</title><date>2014-07-02</date><risdate>2014</risdate><oa>free_for_read</oa></addata></record>
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identifier
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language	chi ; eng
recordid	cdi_epo_espacenet_CN102650819BB
source	esp@cenet
subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	Photo mask and positioning method of photo mask
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T09%3A15%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WEI%20XIAODAN&rft.date=2014-07-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN102650819BB%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true