Array substrate and manufacturing method thereof

The invention relates to a method for manufacturing an array substrate, comprising the following steps: a gate electrode and a gate dielectric layer are successively formed on the substrate; a semiconductor layer, an etching stop layer, a hard film layer and a second patterning photoresist. The phot...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHOU QIWEI, CHEN YUHONG, CHEN JIAYU, ZHANG FANWEI, GU HUILING, DING HONGZHE, ZHONG YIZHEN, LV XUEXING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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